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Plasma Etching: Fundamentals and Applications

by Plasma Etching: Fundamentals and Applications

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Description

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

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Product Details

  • Jul 30, 1998 Pub Date:
  • 019856287X ISBN-10:
  • 9780198562870 ISBN-13:
  • English Language