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Glow-Discharge Hydrogenated Amorphous Silicon (1990)

by Tanaka, K

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Description

A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin

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Product Details

  • Nov 30, 1989 Pub Date:
  • 0792303091 ISBN-10:
  • 9780792303091 ISBN-13:
  • English Language