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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

by Adeleke, Oluwatobi

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Description

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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Product Details

  • May 6, 2025 Pub Date:
  • 1032386738 ISBN-10:
  • 9781032386737 ISBN-13:
  • English Language