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Atomic Layer Deposition Principles Characteristics and Nanotechnology Applications

by [Kääriäinen, Tommi, Cameron, David, Kääriäinen, Marja-Leena, Sherman, Arthur]

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Description

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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Product Details

  • Wiley-Scrivener Brand
  • May 28, 2013 Pub Date:
  • 9781118062777 ISBN-13:
  • 1118062779 ISBN-10:
  • 272.0 pages Hardcover
  • English Language
  • 9.5 in * 0.82 in * 6.32 in Dimensions:
  • 1 lb Weight: