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Precursor Chemistry of Advanced Materials: CVD, Ald and Nanoparticles

by Precursor Chemistry of Advanced Materials: CVD, Ald and Nanoparticles

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Description

M.D. Allendorf, A.M.B. van Mol: Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors.- A. Devi, R.A. Fischer, J. Müller and R. Schmid: Materials Chemistry of Group-13 Nitrides.- M. Veith, S. Mathur: Single-Source-Precursor CVD: Alkoxy and Siloxy Aluminum Hydrides.- S. Schulz: CVD Deposition of Binary AlSb and GaSb Material Films - A Single-Source Approach.- M. Putkonen, L. Niinistö Organometallic Precursors For Atomic Layer Deposition.- Ph. Serp, J.-C. Hierso and Ph. Kalck: Surface Reactivity of Transition Metal CVD Precursors: towards the Control of the Nucleation Step.- M.A. Malik and P. O'Brien: Organometallic and Metal-organic Precursors for Nanoparticles.

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Product Details

  • Springer Brand
  • Feb 12, 2010 Pub Date:
  • 3642056881 ISBN-10:
  • 9783642056888 ISBN-13:
  • 231.0 pages Paperback
  • English Language
  • 9.25 in * 0.53 in * 6.1 in Dimensions:
  • 1 lb Weight: